Skip to content
Home
About Us
Resources
Profiles Metrics
Authors Directory
Institutions Directory
Top Authors
Top Institutions
Top Sponsors
AI Digest
Contact Us
Menu
Home
About Us
Resources
Profiles Metrics
Authors Directory
Institutions Directory
Top Authors
Top Institutions
Top Sponsors
AI Digest
Contact Us
Home
About Us
Resources
Profiles Metrics
Authors Directory
Institutions Directory
Top Authors
Top Institutions
Top Sponsors
AI Digest
Contact Us
Menu
Home
About Us
Resources
Profiles Metrics
Authors Directory
Institutions Directory
Top Authors
Top Institutions
Top Sponsors
AI Digest
Contact Us
Publication Details
AFRICAN RESEARCH NEXUS
SHINING A SPOTLIGHT ON AFRICAN RESEARCH
Nucleation and growth of Fe nanoparticles in SiO2: A TEM, XPS, and Fe L-Edge XANES investigation
Journal of Physical Chemistry C, Volume 115, No. 43, Year 2011
Notification
URL copied to clipboard!
Description
Magnetic iron nanoparticles embedded in insulating oxides matrices are prized targets for "on chip" magnetic sensors, nano fluxgates and nano hard magnets. In this study, the nucleation and growth of iron nanoparticles in the near surface region of 400 nm silica thin films (on silicon substrates) during ion implantation and post- implantation electron beam annealing was systematically investigated by transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and Fe L-edge X-ray absorption near edge spectroscopy (XANES). Results show the presence of Fe oxides after low-fluence low-energy ion implantation in SiO2, suggesting that initially Fe substitutes for Si in the silica matrix. Larger Fe fluences lead to the formation of sub-2 nm metallic Fe nuclei. Postimplantation annealing transformed the dispersed cationic Fe species into metallic Fe nanoclusters (diameter 1-10 nm) that are stabilized by a thin passivating surface oxide film. The versatility of ion implantation and electron beam annealing for the synthesis iron nanoparticles in silica matrices is demonstrated. © 2011 American Chemical Society.
Authors & Co-Authors
Waterhouse, Geoffrey I. N.
New Zealand, Auckland
The University of Auckland
New Zealand, Wellington
Macdiarmid Institute for Advanced Materials and Nanotechnology
Kennedy, John Vedamuthu
New Zealand, Lower Hutt
Gns Science
New Zealand, Wellington
Macdiarmid Institute for Advanced Materials and Nanotechnology
Mitchell, David R.G.
Australia, Sydney
The University of Sydney
Statistics
Citations: 116
Authors: 3
Affiliations: 4
Identifiers
Doi:
10.1021/jp206357c
ISSN:
19327455