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Publication Details
AFRICAN RESEARCH NEXUS
SHINING A SPOTLIGHT ON AFRICAN RESEARCH
chemistry
Hydrogen passivation and reactivation of shallow Zn acceptors in GaAs
Applied Surface Science, Volume 50, No. 1-4, Year 1991
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Description
We report on a study of the hydrogenation of melt-grown Zn-doped GaAs, using a remote DC plasma system. Depth profiles of the free carrier concentration revealed the extent of passivation of the hydrogenated GaAs. Annealing at temperatures between 90 and 160° C for various times, with a reverse bias applied to the Schottky diode, allowed us to observe the reactivation of the Zn-acceptors in the high-field space-charge region of the diode. The thermal dissociation of the electrically neutral ZnH complex is found to obey first-order kinetics, with a dissociation energy EZnH = 1.33 ± 0.03 eV. © 1991.
Authors & Co-Authors
Leitch, Andrew W.R.
Germany, Stuttgart
Max Planck Institute for Solid State Research
Stutzmann, Martin S.
Germany, Stuttgart
Max Planck Institute for Solid State Research
Statistics
Citations: 6
Authors: 2
Affiliations: 1
Identifiers
Doi:
10.1016/0169-4332(91)90204-W
ISSN:
01694332