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Publication Details
AFRICAN RESEARCH NEXUS
SHINING A SPOTLIGHT ON AFRICAN RESEARCH
physics and astronomy
On the deposition rate in a high power pulsed magnetron sputtering discharge
Applied Physics Letters, Volume 89, No. 15, Article 154104, Year 2006
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Description
The effect of the high pulse current and the duty cycle on the deposition rate in high power pulsed magnetron sputtering (HPPMS) is investigated. Using a Cr target and the same average target current, deposition rates are compared to dc magnetron sputtering (dcMS) rates. It is found that for a peak target current density I Tpd of up to 570 mA cm-2, HPPMS and dcMS deposition rates are equal. For I Tpd <570 mA cm-2, optical emission spectroscopy shows a pronounced increase of the Cr+ Cr0 signal ratio. In addition, a loss of deposition rate, which is attributed to self-sputtering, is observed. © 2006 American Institute of Physics.
Authors & Co-Authors
Alami, Jones
Germany, Aachen
Rheinisch-westfälische Technische Hochschule Aachen
Wuttig, Matthias
Germany, Aachen
Rheinisch-westfälische Technische Hochschule Aachen
Statistics
Citations: 152
Authors: 2
Affiliations: 1
Identifiers
Doi:
10.1063/1.2362575
ISSN:
00036951
Research Areas
Environmental