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Publication Details
AFRICAN RESEARCH NEXUS
SHINING A SPOTLIGHT ON AFRICAN RESEARCH
chemistry
Film quantum yields of ultrahigh PAG EUV photoresists
Journal of Photopolymer Science and Technology, Volume 21, No. 3, Year 2008
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Description
Base titration methods are used to determine C-parameters for twenty EUV photoresist platforms. X-ray reflectometry is used to measure the density of these resists, and leads to the determination of absorbance and film quantum yields (FQY). Ultrahigh levels of Photoacid Generator (PAG) show divergent mechanisms for production of photoacids beyond PAG concentrations of 0.35 moles/liter. The FQY of sulfonium PAGs level off, whereas resists prepared with iodonium PAG show FQYs that increase beyond PAG concentrations of 0.35 moles/liter, reaching record highs of 8-13 acids generated/EUV photons absorbed. ©2008 CPST.
Authors & Co-Authors
Brainard, Robert
United States, Albany
Suny Polytechnic Institute
Higgins, Craig
United States, Albany
Suny Polytechnic Institute
Hassanein, Elsayed
Egypt, Sohag
Faculty of Science
Matyi, Richard
United States, Albany
Suny Polytechnic Institute
Wüest, Andrea
United States, Austin
Sematech Austin
Statistics
Citations: 25
Authors: 5
Affiliations: 3
Identifiers
Doi:
10.2494/photopolymer.21.457
ISSN:
09149244
e-ISSN:
13496336